Rick Merritt, EETimes
10/5/2012 9:26 AM EDT
LEUVEN, Belgium – Moore's Law, the engine of semiconductor innovation for decades, is losing steam due to delayed introduction of next-generation extreme ultraviolet lithography. That was the verdict of experts at the 2012 International Symposium on Extreme Ultraviolet Lithography.
EUV systems need light sources that are nearly 20 times more powerful than the ones used today to lay down patterns on next-generation chips that target sizes as small as 14 nm, Following a global symposium on the topic here, a group of lithography experts said that they hope to have the 200W EUV light sources by 2014—but it may take more time.
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