Hsinchu, Taiwan and Sunnyvale, California -- January 15, 2007 -- Faraday Technology Corporation (TAIEX: 3035), a leading ASIC and silicon IP provider, today formally launched process-customized IP business for foundry related IPs. The customization services include special cell library design, special I/O design, special memory design, and IP customization service for a variety of processes. It helps to fulfill the increasing demand of product differentiation from many IC design houses and IDMs.
Mostly, IC design houses use the standard cell library and the related design kit provided by the foundry to develop their designs. However, they always suffer the losing competitiveness due to the limitation of foundry's IP and library availability. Providing highly flexible and customized process-related IPs to meet the various requirements is becoming more and more critical. To ensure customers’ success in the tight competition, from the perspectives of both performance and cost efficiency, Faraday commits to work closely with them to continually enhance the competitiveness through this special IP-customization service.
“Several customers have been benefited from the Process-customized IP services provided by Faraday. With the formal launch of this IP customization business, we would like to reach more customers and help them solve the tough issues they encountered,†said Dr. George Hwang, VP of R&D and Overseas Business at Faraday. “We’ll continue to expand this business to foster our customers in response to the increasing market demand, †Dr. Hwang added.
“For many IC design houses, a single process can seldom fulfill the requirements to cover the whole product life span. Therefore, Faraday's process-customized IP service not only enforce the bridge between IC design houses and foundries but also offer an efficient and effective solution to strengthen their product competitiveness,†said Charlie Cheng, Corporate VP of Worldwide Marketing at Faraday.
Availability
Faraday provides the Process-customized IP services to the generic CMOS processes, ranging from 0.18um to 65nm, and the specific special processes, such as CIS, and High Voltage process.