May 9, 2007 -- DOLPHIN Integration releases a ROM in 65 nm with Ultra high density and ultra low leakage:
- Denser than dense is what everyone in the semiconductor industry is looking for!
- Every mm2 saved in return saves a ggod number of cents.
Its key “two-in-one” patent enables “tROMet Phoenix” to achieve challenging density, while equally offering ultra low leakage.
Typically, the silicon area of a 6-Mbit instance in 65 nm will decrease as far as 0.63 mm2 with only 1.2 uA leakage current, and the same 6-Mbit instance in 90 nm will be as low as 0.95 mm2 with only 1.8 uA leakage current.
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