Infiniscale and Mentor Graphics collaborate with STMicroelectronics to offer a unique design solution for analog parametric yield optimization
Grenoble, France – September 23, 2008 – Infiniscale - the leading provider of behavioral modeling, model-based sizing and parametric yield solutions dedicated to Analog Systems – and Mentor Graphics Corporation, the world-wide leader in EDA Solutions, announced today a collaboration to provide innovative parametric yield optimization to the sub-90nm analog designers’ community, in cooperation with STMicroelectronics, their common major customer.
Infiniscale proposes a model-based solution to handle process and environment variations and design parameters in order to guarantee robust sizing and yield improvement.
“This collaboration with STMicroelectronics and Mentor Graphics is a major milestone for Infiniscale.“ said Firas Mohamed founder and CEO of Infiniscale. “This concludes a series of successes, starting with the adoption of our modeling & sizing solutions by multiple divisions at STMicroelectronics and the promising deployment of our latest product dedicated to DFY (Design for Yield). In this context, tight integration of Infiniscale Lysis™ with Eldo™ and ADVance MS™ from Mentor Graphics offers a unique modeling and model-based yield optimization solution to analog designers making it an ideal combination to overcome today’s parametric yield challenges.”
Commenting on the collaboration, Philippe Raynaud, Mentor Graphics Business Development Manager for Analog/Mixed-Signal simulation, Deep Sub-Micron division noted: “Lysis™ from Infiniscale generates behavioral models based upon Eldo™ accurate and silicon-proven simulation technology. Models do include design, temperature and power-supply parameters but also technology parameters from the design kit. Once models are built, DFY becomes a reality since yield and performance optimization is performed in minutes. Eldo™ and Lysis™ provide users with an outstanding performance increase for sub-65 nm designs where corner-based approach is no more an option."
“ST has extensively evaluated Infiniscale solutions and we’ve been impressed with their modeling technology for treating highly non-linear & complex phenomena. Their solutions have been able to complement our in-house solutions for process variability modeling and their latest model-based yield optimization tool is very promising, our first evaluation was successful,” said Jean-Paul Morin, STMicroelectronics, Technology R&D/Central CAD and Design Solution CAD manager for Analog & RF solutions. “As Mentor Graphics is our main partner in analog simulation, we are keen to collaborate with both companies to get this long-awaited solution for analog yield failure analysis.”
About Infiniscale:
Founded in 2005 and prizewinner in French national competition rewarding innovative technologies, Infiniscale provides leading EDA solutions that do address RF, Analog, mixed-signal and MEMS design challenges. Infiniscale offers a unique behavioral modeling technology and a model-based sizing and yield optimization, which enable designers to drastically reduce design times, analyze process variability and maximize yield and robustness.
Headquartered in Grenoble, FRANCE, Infiniscale has sales offices and representations in Europe, North America and Asia. Visit Infiniscale online at www.infiniscale.com
|
Related News
- Rambus and Mentor Graphics Collaborate to Offer Interoperable PCI Express Solutions; Proven PCI Express-Compliant Solutions Now Available to Chip Designers
- Silicon Creations Selects Mentor Graphics Software for High-Performance Analog and Mixed-Signal IP Verification
- Imagination and Mentor Graphics collaborate to speed verification of MIPS-based designs with Veloce and Codelink
- Embedded Virtual Prototype Kits Offer Unified HW-SW Debug and Analysis
- Mentor Graphics Acquires Berkeley Design Automation to Advance Nanometer Analog/Mixed-Signal Verification
Breaking News
- Keysight, Synopsys, and Ansys Deliver Radio Frequency Design Migration Flow to TSMC's N6RF+ Process Node
- Siemens collaborates with TSMC on design tool certifications for the foundry's newest processes and other enablement milestones
- Leveraging Cryogenics and Photonics for Quantum Computing
- Kalray Joins Arm Total Design, Extending Collaboration with Arm on Accelerated AI Processing
- Credo at TSMC 2024 North America Technology Symposium
Most Popular
- Huawei Mate 60 Pro processor made on SMIC 7nm N+2 process
- Silicon Creations Reaches Milestone of 10 Million Wafers in Production with TSMC
- GUC provides 3DIC ASIC total service package to AI/HPC/Networking customers
- Analog Bits to Demonstrate Numerous Test Chips Including Portfolio of Power Management and Embedded Clocking and High Accuracy Sensor IP in TSMC N3P Process at TSMC 2024 North America Technology Symposium
- Alphawave Semi: FY 2023 and 2024 YTD Trading Update and Notice of Results
E-mail This Article | Printer-Friendly Page |