Synopsys exec sees whole new ball game at 20 nm
Dylan McGrath, EETimes
6/4/2012 4:01 PM EDT
SAN FRANCISCO—The requirement for lithography double patterning on many layers makes moving to the 20-nm node a major undertaking that will require customers to invest in new design tool sets, according to Saleem Haider, senior director of marketing for physical design and DFM at Synopsys Inc.
In an interview at the Design Automation Conference (DAC) Monday (June 4), Haider said that in his 15 years at Synopsys the company has always taken the position that migration to a new node was an incremental, rather than revolutionary, change. Competitors, meanwhile, eager to gain market share in physical design implementation, have tried to convince customers that each node migration ushered in a brand new world, Haider said.
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