Dec. 18, 2025 –
Intel Foundry announced that it has managed to install the world's most advanced EUV machine—ASML's TWINSCAN EXE:5200B High-NA EUV scanner—in its facilities. The company is producing its 14A node using High-NA EUV lithography, marking the first industry transition from Low-NA. In collaboration with ASML, Intel has completed acceptance testing at Intel Foundry for its 14A node to enhance wafer output. The TWINSCAN EXE:5200B is ASML's second version of High-NA EUV scanners, following the TWINSCAN EXE:5000, which Intel initially used for its 14A trial runs. Intel previously reported processing over 30,000 wafers in a single quarter, achieving simplified manufacturing by reducing the steps needed for a specific layer from 40 to fewer than 10, resulting in significantly faster cycle times